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Helmut-Fischer FISCHERSCOPE® X-RAY XDV®-µ

Helmut-Fischer FISCHERSCOPE® X-RAY XDV®-µ
Helmut-Fischer FISCHERSCOPE® X-RAY XDV®-µ

Helmut-Fischer FISCHERSCOPE® X-RAY XDV®-µ

Universal instrument for measuring on very small and flat components and structures as well as complex multilayer systems.

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Description Features Applications

For the highest demands down to the smallest µ.

The FISCHERSCOPE® X-RAY XDV®-µ instruments are among Fischer’s high-end X-ray fluorescence measuring devices and are ideal for measuring tiny structures. They are equipped with the latest generation of powerful silicon drift detectors, microfocus tube Ultra and in-house produced polycapillary optics. Due to the high radiation intensity, measuring times are drastically reduced and highly precise measurements on the smallest measuring spots are possible.

  • Meeting all challenges.

Reliable and fast results for ambitious measuring tasks

  • Most advanced polycapillary optics on the market.

Our in-house manufactured polycapillary optics deliver outstanding measurement results with short measuring times

  • Programmable.

Automated measurements on predefined structures thanks to advanced pattern recognition technology

  • Fully automatable.

Let your instrument work for you with just one click

  • DPP+ digital pulse processor.

Shorter measuring times or improvement of standard deviation (compared to the DPP)

  • Microfocus tube Ultra with tungsten anode for even higher performance on smallest spots; Molybdenum anode optional
  • Changeable filter
  • Higher count rates and significantly reduced measurement times thanks to DPP+
  • Polycapillary optics allow particularly small measuring spots with short measuring times with high intensity
  • Measuring spot approx.: Ø 10 or 17 µm
  • Silicon drift detector with 20 or 50 mm² active area for highest precision
  • Up to 135 mm possible height of samples
  • Measuring on smallest, flat components and structures like traces, contacts or lead frames
  • Measuring functional layers in the electronics and semiconductor industry
  • Determination of complex multilayer systems
  • Automated measuring, such as in quality control
  • Measuring of light elements, e.g. determination of phosphorus content in electroless nickel under gold and palladium (ENIG/ENEPIG)